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Thin-Film and Epitaxy Laboratory (DünE)

Sputterpanorama
Photo: Martin Becker

Thin-Film and Epitaxy Laboratory (DünE)

The DünE platform comprises physical methods for the synthesis of thin solid films (primarily metal and metal-oxide films). They are operated by different research groups within the departments of physics and chemistry:

  • Atomic Layer Deposition (ALD) - Picosun R-200 with glovebox and the possibility of coating porous substrates, processes with water or ozone.
    Person in charge is  / group of Prof. Chatterjee.

  • Pulsed Laser Deposition (PLD) - Surface Workstation / self-construction with UV laser, glovebox.
    Person in charge is  / group of Prof. Janek.

  • Molecular Beam Epitaxy (MBE).
    Person in charge is  / group of Prof. Chatterjee.

  • Magnetron Sputtering Facility -  self-construction / modified, RF and pulsed operation, substrate heating, up to 5 materials in the film stack without air contact, glovebox.
    Person in charge is  / group of Prof. Klar.

  • Ion Beam Sputtering Facility - self-construction, with substrate heating, up to 3 materials in the film stack without air contact, dual beam (combined deposition of materials).
    Person in charge is / group of Prof. Klar.

  • Magnetron Sputtering Facility - Surface, with glovebox.
    Person in charge is  / group of Prof. Janek.

  • Ion Beam Sputtering Facility - Surface Workstation, with glovebox.
    Person in charge is  / group of Prof. Janek.

Please find the usage regulations (in German) here.