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Schörmann, Jörg

Thin-Film Technology

The research focus is on the production of thin oxide- and nitride layers as well as nanostructures from group III-nitrides. The applications of these structures are in optoelectronics and sensor technology. Plasma-assisted molecular beam epitaxy (PAMBE) and atomic layer deposition (ALD) are used as manufacturing processes. Various methods such as high-resolution X-ray diffraction (XRD), atomic force microscopy (AFM), photoluminescence spectroscopy (PL) etc. are available for characterization within the framework of the Center for Materials Research.



Dr. Jörg Schörmann

Institute of Experimental Physics I

Phone: +49-641-99-33122
Fax: +49-641-99-33139

Physics building, Heinrich-Buff-Ring 16, Room 334


  • Semiconductor Devices
  • Surface Technologies
  • Optical Materials



  • Atomic Layer Deposition
  • Micro and Nanofabrication
  • Optical Spectroscopy
  • Physical Deposition
  • X-Ray Scattering Methods
  • Structural Analytics


Classes of Materials:

  • Thin Films
  • Semiconductors
  • Hybrid Materials
  • Molecular Materials
  • Nanomaterials
  • Oxides