Atomic Layer Deposition (ALD)

Research Group in Charge:

Prof. Dr. Sangam Chatterjee

Platform:

Thin-Film and Epitaxy Laboratory (DünE)

Location:

Physics Building, Heinrich-Buff-Ring 16, room 06 (basement)

Type, properties, other information:

Picosun R-200 Standard with attached glove box for working in an inert atmosphere. Planar, porous and powder samples can be coated with thin metal and metal oxide layers. Available are Al₂O₃, CeO₂, HfO₂, MgO, NiO, Pt, SiO₂, TiO₂ and ZnO. Other materials are possible after consultation.

Person in Charge:

Dr. Jörg Schörmann

Institute of Experimental Physics I

Physics Building, Heinrich-Buff-Ring 16, room 334

Phone +49-641-99-33122

e-Mail