June 2011

A new machine for pulsed laser deposition (PLD) of thin films arrived at the Institute of Physical Chemistry in the beginning of February. It is equipped with two lasers with different wavelengths: an excimer laser in the UV range and a Neodym-YAG laser in the infrared range. In addition to the different wavelengths for ablation the machine is equipped with two systems for substrate heating: a resistive heater and an infrared laser heater for direct heating of the substrate rear side. The targets with primary material are assembled in a rotating table with 5 positions. These targets are positioned into the laser beam automatically according to a previously programmed process. Likewise the background pressure is adjusted automatically by mass flow controllers. A manipulator bar allows direct gating out of and into a glove box attached to the machine. Thus handling of air sensitive thin films is possible. Picture submitted by A. Braun