September 2011Since May, a spectrometer of the type PHI 5000 VersaProbe™ is available for Electron Spectroscopy for Chemical Analysis (ESCA) at the Institute of Physical Chemistry. This facility offers analysis methods like X-Ray photoelectron spectroscopy (XPS), Ultra-violet photoelectron spectroscopy (UPS), and Auger electron spectroscopy (AES). By sputtering with an Argon or C60 source, it is possible to measure depth profiles of a sample. An aluminium anode is used to create a monochromatic X-ray beam for XPS measurements. This beam can be focused (<10 μm) on points of interest of the sample surface also enabling to create lateral maps of the sample composition. The region to be analyzed can be chosen by previously recording scanning X-ray (SXI) or scanning electron microscopy (SEM) images. Furthermore, it is possible to perform angle-resolved measurements (AR-XPS). Picture submitted by H. Metelmannhttps://www.uni-giessen.de/en/faculties/f08/departments/physchem/janek/gallerypotm/gallery-of-pictures-from-2011/september-2011/viewhttps://www.uni-giessen.de/@@site-logo/logo.png
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September 2011
Since May, a spectrometer of the type PHI 5000 VersaProbe™ is available for Electron Spectroscopy for Chemical Analysis (ESCA) at the Institute of Physical Chemistry. This facility offers analysis methods like X-Ray photoelectron spectroscopy (XPS), Ultra-violet photoelectron spectroscopy (UPS), and Auger electron spectroscopy (AES). By sputtering with an Argon or C60 source, it is possible to measure depth profiles of a sample. An aluminium anode is used to create a monochromatic X-ray beam for XPS measurements. This beam can be focused (<10 μm) on points of interest of the sample surface also enabling to create lateral maps of the sample composition. The region to be analyzed can be chosen by previously recording scanning X-ray (SXI) or scanning electron microscopy (SEM) images. Furthermore, it is possible to perform angle-resolved measurements (AR-XPS). Picture submitted by H. Metelmann
